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美國 Denton Vacuum
金 / 碳鍍膜機
蒸發膜的厚度分佈
蒸發源的排放分佈特性可用於確定真空室中用於生產均勻厚度塗層的正確幾何形狀。
在大孔徑襯底上或者在裝載有許多小襯底的架子上生產均勻厚度的塗層可以通過對裝有測試件的架子進行重複試驗來完成。從一次試運行到下一次試運行，有意改變了幾何形狀 - 例如蒸發源的偏移量增加了，直到找到最佳排列。
在本文中，我們首先測量了位於已知徑向距離處的測試件上的塗層的厚度，在真空蒸發室中的單個旋轉平板架上，並使用這些數據來查找源發射函數。然後使用已知的發射函數來確定在直徑上產生最佳厚度均勻性的源偏移和弧線曲率。
Read the Paper Now
更低的成本...更高的投資回報率
離子輔助沉積可提供高要求的光學應用所需的高品質，無缺陷，低應力，環境穩定（無漂移）的薄膜。
您將受益於：
獨立控制離子電流密度和離子能量以優化薄膜性能
長期運行，100％ 氧氣或氮氣反應氣體穩定運行，延長運行時無過程漂移
冷陰極離子源是差分泵浦器件，等離子體腔室的一端通向真空環境。離子源的操作參數和薄膜的質量受控制真空度的參數的影響。在抽速很高的系統中製作好的薄膜要容易得多。當比較 IAD 薄膜沉積參數時，壓力的差異可能是由泵浦速率引起的。
要了解泵浦速率對冷陰極離子源的影響，請下載我們的技術文章 download our technical paper.
Explorer
THIN FILM DEPOSITION PLATFORM
Denton’s most popular, flexible system, the high vacuum EXPLORER can be equipped for thermal evaporation, e-beam evaporation, sputtering, or even PECVD in order to perform research, development and production.
TYPICAL APPLICATIONS :
- PECVD
• Materials Research
• Small Batch Systems
• 3D Objects
• Coat a Variety of Materials
- EVAPORATION
• Materials Research
• Ion Assisted Deposition (IAD)
• Medical Devices
• Telecommunications
• CD Mastering
• Lift-Off
• Protective Coating
- SPUTTERING
• Materials research
• Product QC & QA
• Semiconductor Failure Analysis
• CD Mastering
• Nanotechnology
• Compound Semiconductors
• OLEDs
CAPABILITIES & FEATURES :
• Thermal & E-Beam Evaporation
• Ion Beam Assisted Deposition
• DC/Pulse DC/RF Sputtering & Co-sputtering
• Base Vacuum in the 10-6 torr scale range
• 8" (200 mm) Substrate Size or Larger
• Load Lock Option
• PECVD Process Options
DV-502
HIGH VACUUM EVAPORATOR PLATFORM
With rapid cycle times, on-board deposition control and a large deposition zone, the DV-502 gives users a flexible, high vacuum evaporation or sputtering system equipped for a wide range of applications.
TYPICAL APPLICATIONS :
- EVAPORATION
• High vacuum carbon coating for TEM & X-ray analysis
• Carbon support films
• Carbon platinum replicas
• Aperture cleaning
• Rotary shadowing
• Asbestos analysis
• Resistance evaporation
• Failure analysis
• High purity ultra thin films
CAPABILITIES & FEATURES :
• High Vaccum Gate Valve for Rapid Cycling
• Diffusion or Turbo-moloecular Pump Options
• Dedicated Sputtering or Evaporation Capability
• Integrated Thickness Monitors and Controllers
• AC Glow for Sample CLeaning
• Base Vacuum in the 10-6 torr scale range
• 6" (150 mm) Diameter Substrate Size
Desktop Pro
COMPACT, HIGH PERFORMANCE SPUTTERING PLATFORM
With two sputtering cathodes and a turbo-molecular pump, the DESKTOP PRO is a compact, high vacuum platform for research, production support and sample preparation.
TYPICAL APPLICATIONS :
- SPUTTERING
• Materials Research
• Product QC & QA
• Semiconductor failure analysis
• Nanotechnology
• Compound semiconductors
CAPABILITIES & FEATURES :
• DC and RF Sputtering
• One or Two Cathode Configuration
• Co-sputtering Capable
• Base Vacuum in the 10-6 torr scale range
• 6” (150 mm) Diameter Substrate Size
Desk V HP 專用電子顯微鏡樣品製備
– 金 / 碳鍍膜機特點 (SEM / TEM / FE-SEM)
● 內置泵系統
● 極短的沉積時間
● 一致的沉積參數
● 圖形介面彩色觸摸板
● 薄膜厚度控制
● 樣品清潔的蝕刻模式
● 多樣靶材材料選擇
● 更多可選功能
